| Product Name |
Post Cu/Low-k CMP Cleaning Solution, "MCX-SDR4" |
| Generic Product Name |
Advanced Cleaning Solutions |
| Company Name |
Mitsubishi Chemical Corporation |
| Department Name |
Semiconductor Materials Dept., Information & Electronics Div., Advanced Solutions |
| TEL |
+81-3-6748-7168 |
| Product Information |
During the post CMP cleaning process in semiconductor manufacturing, it is important to remove organic residues and particles on Cu wires and Low-k films without damaging the substrate. Our product, MCX-SDR4, is a high-efficiency cleaning solution suited for semiconductor industries. Characteristics: -High efficiency particle removal -Removes organic residues effectively -Limits galvanic corrosion on Cu wire -Limits Low-k damage -Improves Low-k wetting properties |
| Homepage |
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